Optimization of technological parameters in plasma chemical etching of quartz single crystals
Crossref DOI link: https://doi.org/10.1134/S1070427216060033
Published Online: 2016-09-28
Published Print: 2016-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Osipov, A. A.
Alexandrov, S. E.
Osipov, Ar. A.
License valid from 2016-06-01