Systematic investigation of the reactive ion beam sputter deposition process of SiO2
Crossref DOI link: https://doi.org/10.1140/epjb/e2018-80453-x
Published Online: 2018-02-19
Published Print: 2018-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Mateev, Maria
Lautenschläger, Thomas
Spemann, Daniel
Finzel, Annemarie
Gerlach, Jürgen W.
Frost, Frank
Bundesmann, Carsten
Text and Data Mining valid from 2018-02-01
Article History
Received: 4 August 2017
Revised: 21 December 2017
First Online: 19 February 2018