Thermally activated diffusion of impurities along a semiconductor layer
Crossref DOI link: https://doi.org/10.1140/epjb/s10051-021-00265-x
Published Online: 2022-01-12
Published Print: 2022-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Abebe, Yoseph http://orcid.org/0000-0003-3882-1712
Birhanu, Tibebe
Demeyu, Lemi
Taye, Mesfin
Bekele, Mulugeta
Bassie, Yigermal
Text and Data Mining valid from 2022-01-01
Version of Record valid from 2022-01-01
Article History
Received: 15 November 2021
Accepted: 16 December 2021
First Online: 12 January 2022