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Thermally activated diffusion of impurities along a semiconductor layer

Crossref DOI link: https://doi.org/10.1140/epjb/s10051-021-00265-x

Published Online: 2022-01-12

Published Print: 2022-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Abebe, Yoseph https://orcid.org/0000-0003-3882-1712
Birhanu, Tibebe

Demeyu, Lemi

Taye, Mesfin

Bekele, Mulugeta

Bassie, Yigermal
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Text and Data Mining valid from 2022-01-01

Version of Record valid from 2022-01-01
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Article History

Received: 15 November 2021

Accepted: 16 December 2021

First Online: 12 January 2022