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Ion beam sputter deposition of $$\hbox {SiO}_2$$ thin films using oxygen ions

Crossref DOI link: https://doi.org/10.1140/epjb/s10051-022-00307-y

Published Online: 2022-03-04

Published Print: 2022-03

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Bernstein, Jacques

Gerlach, Jürgen W.

Finzel, Annemarie

Bundesmann, Carsten https://orcid.org/0000-0003-0599-5038
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Text and Data Mining valid from 2022-03-01

Version of Record valid from 2022-03-01
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Article History

Received: 12 October 2021

Accepted: 22 February 2022

First Online: 4 March 2022