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CF4 doping effects on SiOF thin films: chemical, structural and dielectric properties in PECVD-deposited films from HMDSO/O2 vapor mixtures

Crossref DOI link: https://doi.org/10.1140/epjb/s10051-025-00973-8

Published Online: 2025-05-31

Published Print: 2025-05

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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