Plasma characterization in reactive sputtering processes of Ti in Ar/O2 mixtures operated in metal, transition and poisoned modes: a comparison between direct current and high-power impulse magnetron discharges
Crossref DOI link: https://doi.org/10.1140/epjd/e2017-80106-x
Published Online: 2017-10-03
Published Print: 2017-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Haase, Fabian
Kersten, Holger
Lundin, Daniel http://orcid.org/0000-0001-8591-1003
License valid from 2017-10-01