On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films
Crossref DOI link: https://doi.org/10.1140/epjd/e2017-80364-6
Published Online: 2018-05-25
Published Print: 2018-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Schäfer, Jan
Sigeneger, Florian
Foest, Rüdiger
Loffhagen, Detlef
Weltmann, Klaus-Dieter
Text and Data Mining valid from 2018-05-01
Article History
Received: 30 May 2017
Revised: 14 August 2017
First Online: 25 May 2018