Monte Carlo simulation of the implantation profile of e+ in nanochanneled silicon
Crossref DOI link: https://doi.org/10.1140/epjd/e2018-90344-y
Published Online: 2018-11-20
Published Print: 2018-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Guatieri, Francesco
Mariazzi, Sebastiano
Brusa, Roberto Sennen
Text and Data Mining valid from 2018-11-01
Article History
Received: 11 July 2018
First Online: 20 November 2018