Mathematical modeling of pattern formation caused by drying of colloidal film under a mask
Crossref DOI link: https://doi.org/10.1140/epje/i2016-16026-5
Published Online: 2016-02-26
Published Print: 2016-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Tarasevich, Yuri Yu.
Vodolazskaya, Irina V.
Sakharova, Lyudmila V.
Text and Data Mining valid from 2016-02-01