Effect of N2/Ar on structure and hardness of TaN-Ag thin films deposited by DC cylindrical magnetron sputtering
Crossref DOI link: https://doi.org/10.1140/epjp/i2014-14080-8
Published Online: 2014-05-09
Published Print: 2014-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Foadi, Farnaz
Darabi, Elham
Reza Hantehzadeh, Mohammad
Text and Data Mining valid from 2014-05-01