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Mechanical properties of Ta-Al-N thin films deposited by cylindrical DC magnetron sputtering: Influence of N2% in the gas mixture

Crossref DOI link: https://doi.org/10.1140/epjp/i2016-16187-2

Published Online: 2016-06-06

Published Print: 2016-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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