Structural and dielectric properties of TiO2 thin films grown at different sputtering powers
Crossref DOI link: https://doi.org/10.1140/epjp/i2019-12407-7
Published Online: 2019-01-08
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Akgul, Unal
Text and Data Mining valid from 2019-01-01
Article History
Received: 10 September 2018
Accepted: 15 November 2018
First Online: 8 January 2019