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The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

Crossref DOI link: https://doi.org/10.1186/s11671-015-0757-y

Published Online: 2015-02-06

Published Print: 2015-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Wang, Zi-Yi

Zhang, Rong-Jun

Lu, Hong-Liang

Chen, Xin

Sun, Yan

Zhang, Yun

Wei, Yan-Feng

Xu, Ji-Ping

Wang, Song-You

Zheng, Yu-Xiang

Chen, Liang-Yao
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Article History

Received: 19 November 2014

Accepted: 15 January 2015

First Online: 6 February 2015