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Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures

Crossref DOI link: https://doi.org/10.1186/s11671-016-1623-2

Published Online: 2016-09-13

Published Print: 2016-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Feng, Xing-Yao

Liu, Hong-Xia

Wang, Xing

Zhao, Lu

Fei, Chen-Xi

Liu, He-Lei
Funding

Funding for this research was provided by:

National Natural Science Foundation of China (61376099, 61434007)

Foundation for Fundamental Research of China (JSZL2016110B003)
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License valid from 2016-09-13