Crossmark

Effects of Annealing Ambient on the Characteristics of LaAlO3 Films Grown by Atomic Layer Deposition

Crossref DOI link: https://doi.org/10.1186/s11671-017-1889-z

Published Online: 2017-02-10

Published Print: 2017-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Zhao, Lu

Liu, Hong-xia

Wang, Xing

Fei, Chen-xi

Feng, Xing-yao

Wang, Yong-te
Funding

Funding for this research was provided by:

National Natural Science Foundation of China (61376099, 61434007)

Foundation for Fundamental Research of China (JSZL2016110B003)
License Information

License valid from 2017-02-10