Crossmark

Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering

Crossref DOI link: https://doi.org/10.1186/s40563-015-0031-7

Published Online: 2015-02-11

Published Print: 2015-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Scholtz, Juliano Sadi

Stryhalski, Joel

Sagás, Julio César

Recco, Abel André Cândido

Mezaroba, Marcello

Fontana, Luís César
License Information

License valid from 2015-02-11
More Information

Article History

Received: 20 November 2014

Accepted: 8 January 2015

First Online: 11 February 2015