Electron beam lithography with feedback using in situ self-developed resist
Crossref DOI link: https://doi.org/10.1186/1556-276X-9-184
Published Online: 2014-04-16
Published Print: 2014-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Dey, Ripon Kumar
Cui, Bo
Text and Data Mining valid from 2014-04-16
Article History
Received: 8 January 2014
Accepted: 4 April 2014
First Online: 16 April 2014