Performance enhancement of multiple-gate ZnO metal-oxide-semiconductor field-effect transistors fabricated using self-aligned and laser interference photolithography techniques
Crossref DOI link: https://doi.org/10.1186/1556-276X-9-242
Published Online: 2014-05-17
Published Print: 2014-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lee, Hsin-Ying
Huang, Hung-Lin
Tseng, Chun-Yen
Text and Data Mining valid from 2014-05-17
Article History
Received: 31 March 2014
Accepted: 3 May 2014
First Online: 17 May 2014