Electrical characteristic fluctuation of 16-nm-gate high-κ/metal gate bulk FinFET devices in the presence of random interface traps
Crossref DOI link: https://doi.org/10.1186/1556-276X-9-633
Published Online: 2014-11-25
Published Print: 2014-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Hsu, Sheng-Chia
Li, Yiming
Text and Data Mining valid from 2014-11-25
Article History
Received: 29 June 2014
Accepted: 2 November 2014
First Online: 25 November 2014