Inductive crystallization effect of atomic-layer-deposited Hf0.5Zr0.5O2 films for ferroelectric application
Crossref DOI link: https://doi.org/10.1186/s11671-014-0711-4
Published Online: 2015-01-31
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhang, Xun
Chen, Lin
Sun, Qing-Qing
Wang, Lu-Hao
Zhou, Peng
Lu, Hong-Liang
Wang, Peng-Fei
Ding, Shi-Jin
Zhang, David Wei
License valid from 2015-01-31
Article History
Received: 14 November 2014
Accepted: 23 December 2014
First Online: 31 January 2015