Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds
Crossref DOI link: https://doi.org/10.1186/s11671-015-0731-8
Published Online: 2015-02-06
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wei, Yaowei
Pan, Feng
Zhang, Qinghua
Ma, Ping
License valid from 2015-02-06
Article History
Received: 12 November 2014
Accepted: 5 January 2015
First Online: 6 February 2015