Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
Crossref DOI link: https://doi.org/10.1186/s11671-015-0798-2
Published Online: 2015-03-19
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Xiang, Yuren
Zhou, Chunlan
Jia, Endong
Wang, Wenjing
License valid from 2015-03-19
Article History
Received: 16 December 2014
Accepted: 4 February 2015
First Online: 19 March 2015