Investigation on the passivated Si/Al2O3 interface fabricated by non-vacuum spatial atomic layer deposition system
Crossref DOI link: https://doi.org/10.1186/s11671-015-0803-9
Published Online: 2015-02-28
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lien, Shui-Yang
Yang, Chih-Hsiang
Wu, Kuei-Ching
Kung, Chung-Yuan
License valid from 2015-02-28
Article History
Received: 16 November 2014
Accepted: 5 February 2015
First Online: 28 February 2015