Uniformity and passivation research of Al2O3 film on silicon substrate prepared by plasma-enhanced atom layer deposition
Crossref DOI link: https://doi.org/10.1186/s11671-015-0831-5
Published Online: 2015-03-13
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jia, Endong
Zhou, Chunlan
Wang, Wenjing
License valid from 2015-03-13
Article History
Received: 15 December 2014
Accepted: 18 February 2015
First Online: 13 March 2015