Silicon diffusion control in atomic-layer-deposited Al2O3/La2O3/Al2O3 gate stacks using an Al2O3 barrier layer
Crossref DOI link: https://doi.org/10.1186/s11671-015-0842-2
Published Online: 2015-03-19
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wang, Xing
Liu, Hong-Xia
Fei, Chen-Xi
Yin, Shu-Ying
Fan, Xiao-Jiao
License valid from 2015-03-19
Article History
Received: 16 November 2014
Accepted: 27 February 2015
First Online: 19 March 2015