The influence of process parameters and pulse ratio of precursors on the characteristics of La1 − x Al x O3 films deposited by atomic layer deposition
Crossref DOI link: https://doi.org/10.1186/s11671-015-0883-6
Published Online: 2015-04-14
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fei, Chenxi
Liu, Hongxia
Wang, Xing
Fan, Xiaojiao
License valid from 2015-04-14
Article History
Received: 15 November 2014
Accepted: 26 March 2015
First Online: 14 April 2015