CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single Mask
Crossref DOI link: https://doi.org/10.1186/s11671-015-1046-5
Published Online: 2015-08-26
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Meng, Lingkuan
Gao, Jianfeng
He, Xiaobin
Li, Junjie
Wei, Yayi
Yan, Jiang
Funding for this research was provided by:
Chinese National Science and Technology Major Project (2009ZX02035)
Bejing Natural Science Foundation (Y4BK01X001)