Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
Crossref DOI link: https://doi.org/10.1186/s11671-017-1925-z
Published Online: 2017-02-21
Published Print: 2017-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Qian, Shi-Bing
Wang, Yong-Ping
Shao, Yan
Liu, Wen-Jun
Ding, Shi-Jin
Funding for this research was provided by:
National Natural Science Foundation of China (61274088;61474027)
License valid from 2017-02-21