Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy
Crossref DOI link: https://doi.org/10.1186/s11671-017-2131-8
Published Online: 2017-05-19
Published Print: 2017-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yan, Baojun
Liu, Shulin
Heng, Yuekun
Yang, Yuzhen
Yu, Yang
Wen, Kaile
License valid from 2017-05-19