Correction to: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition
Crossref DOI link: https://doi.org/10.1186/s11671-019-3028-5
Published Online: 2019-05-27
Published Print: 2019-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Xu, Hongyan
Han, Feng
Xia, Chengkai
Wang, Siyan
Ramachandran, Ranjith K.
Detavernier, Christophe
Wei, Minsong
Lin, Liwei
Zhuiykov, Serge
Text and Data Mining valid from 2019-05-27
Version of Record valid from 2019-05-27
Article History
First Online: 27 May 2019