Influence of light-curing distance on degree of conversion and cytotoxicity of etch-and-rinse and self-etch adhesives
Crossref DOI link: https://doi.org/10.1186/s12903-016-0239-3
Published Online: 2016-07-07
Published Print: 2017-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wegehaupt, Florian J. http://orcid.org/0000-0002-3972-0561
Lunghi, Nancy
Belibasakis, Georgios N.
Attin, Thomas
License valid from 2016-07-07