Sidewall lithography of micron-sized features in high-aspect-ratio meso-scale channels using a three-dimensional assembled mask
Crossref DOI link: https://doi.org/10.1186/s40486-014-0006-7
Published Online: 2014-08-15
Published Print: 2014-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ji, Chang-Hyeon
Herrault, Florian
Allen, Mark G
License valid from 2014-08-15