Etching characteristics of Si{110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS
Crossref DOI link: https://doi.org/10.1186/s40486-017-0057-7
Published Online: 2017-05-26
Published Print: 2017-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Rao, A. V. Narasimha
Swarnalatha, V.
Pal, P. http://orcid.org/0000-0001-7345-9769
Funding for this research was provided by:
Department of Science and Technology Delhi India (SR/S3/MERC/072/2011)
Council of Scientific and Industrial Research (03(1320)/14/EMR-II)
License valid from 2017-05-26