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Wet anisotropic etching characteristics of Si{111} in NaOH-based solution for silicon bulk micromachining

Published Online: 2022-12-01

Authors

Purohit, S.

Swarnalatha, V.

Pandey, A. K.

Pal, P. http://orcid.org/0000-0001-7345-9769
Funding

Funding for this research was provided by:

Human Resource Development Group
License Information

Text and Data Mining valid from 2022-12-01

Version of Record valid from 2022-12-01
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Article History

Received: 24 September 2022

Accepted: 14 November 2022

First Online: 1 December 2022

Declarations

:

: Not applicable.

: All authors agreed to this publication.

: The authors declare that they have no competing interests.

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