Thin film bi-epitaxy and transition characteristics of TiO2/TiN buffered VO2 on Si(100) substrates
Crossref DOI link: https://doi.org/10.1557/adv.2016.544
Published Online: 2016-08-05
Published Print: 2016-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Moatti, Adele
Bayati, Reza
Singamaneni, Srinivasa Rao
Narayan, Jagdish
Funding for this research was provided by:
Division of Materials Research (DMR-1304607)
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Article History
First Online: 5 August 2016