Reliability of Metal Gate / High-k devices and its impact on CMOS technology scaling
Crossref DOI link: https://doi.org/10.1557/adv.2017.504
Published Online: 2017-07-25
Published Print: 2017-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kerber, Andreas
Text and Data Mining valid from 2017-07-25
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Article History
First Online: 25 July 2017