Evaluation of MoS2 Films Fabricated by Metal-Organic Chemical Vapor Deposition Using a Novel Mo Precursor i-Pr2DADMo(CO)3 Under Various Deposition Conditions
Crossref DOI link: https://doi.org/10.1557/adv.2020.187
Published Online: 2020-09-27
Published Print: 2020-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yamazaki, K.
Hibino, Y.
Oyanagi, Y.
Hashimoto, Y.
Sawamoto, N.
Machida, H.
Ishikawa, M.
Sudo, H.
Wakabayashi, H.
Ogura, A.
Text and Data Mining valid from 2020-06-01
Version of Record valid from 2020-06-01
Article History
First Online: 27 September 2020