Crossmark

Influence of material and process parameters in the dry-development of positive-tone, polyaldehyde photoresist

Crossref DOI link: https://doi.org/10.1557/jmr.2020.243

Published Online: 2020-09-10

Published Print: 2020-11-16

Update policy: https://doi.org/10.1017/policypage

Authors

Engler, Anthony

Tobin, Cassidy

Lo, Chi Kin

Kohl, Paul A.
License Information

License valid from 2020-09-10
More Information

Copyright and Licensing

Copyright: Copyright © The Author(s), 2020, published on behalf of Materials Research Society by Cambridge University Press