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Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures

Crossref DOI link: https://doi.org/10.1557/s43580-021-00188-w

Published Online: 2021-12-15

Published Print: 2021-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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