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Germanium ion implantation performance improvement on applied materials’ VIISta HCS high current implanter with use of germanium tetrafluoride (GeF4) and hydrogen (H2) mixture gases

Crossref DOI link: https://doi.org/10.1557/s43580-022-00402-3

Published Online: 2022-11-28

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Tang, Ying https://orcid.org/0000-0003-2910-3292
Leong, Chee Weng

Lim, Han Keong

Tiu, Chee King

Tien, Eric
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Text and Data Mining valid from 2022-11-28

Version of Record valid from 2022-11-28
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Article History

Received: 19 October 2022

Accepted: 11 November 2022

First Online: 28 November 2022

Declarations

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: The authors did not receive support from any third parties for the submitted work.

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