Crossmark

Challenges of high dose ion implantations in photo-resist covered wafers for power device processing

Published Online: 2025-02-05

Published Print: 2025-02

Authors

Schmeide, Matthias

Petry, Klaus

Krimbacher, Bernhard
License Information

Text and Data Mining valid from 2025-02-01

Version of Record valid from 2025-02-01
More Information

Article History

Received: 16 September 2024

Accepted: 16 January 2025

First Online: 5 February 2025

Declarations

:

: The authors declare no conflict of interest.

Document is current