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PMOS Rc reduction using B2H6 plasma doping process and advanced anneals for the current and next-gen DRAM devices

Published Online: 2025-03-05

Published Print: 2025-04

Authors

Bhosle, V. https://orcid.org/0009-0006-5908-620X
Cai, M.

Sharma, S.

Ng, Ben

Liu, Michael

Raj, D.
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Text and Data Mining valid from 2025-03-05

Version of Record valid from 2025-03-05
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Article History

Received: 18 September 2024

Accepted: 11 February 2025

First Online: 5 March 2025

Declarations

:

: There is no conflict of interest to declare.

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