Graphene oxide deposition on SiO2 wafer via plasma-assisted technique
Crossref DOI link: https://doi.org/10.1557/s43580-025-01513-3
Published Online: 2026-01-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ponciano, B. https://orcid.org/0009-0001-3188-0392
Reyes, P.
Mulia, J.
Gómez, A.
Martínez, H.
Text and Data Mining valid from 2026-01-06
Version of Record valid from 2026-01-06
Article History
Received: 12 September 2025
Accepted: 12 December 2025
First Online: 6 January 2026
Declarations
:
: The authors declare no conflict of interest.
: No procedures were performed in the studies involving human participants.