Nanoscale Hafnium Oxide RRAM Devices Exhibit Pulse Dependent Behavior and Multi-level Resistance Capability
Crossref DOI link: https://doi.org/10.1557/adv.2016.377
Published Online: 2016-05-20
Published Print: 2016-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Beckmann, Karsten
Holt, Josh
Manem, Harika
Van Nostrand, Joseph
Cady, Nathaniel C.
Funding for this research was provided by:
Air Force Research Laboratory (FA87501110008)
Text and Data Mining valid from 2016-05-20
Version of Record valid from 2016-05-20
Article History
First Online: 20 May 2016