Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties
Crossref DOI link: https://doi.org/10.1557/adv.2017.404
Published Online: 2017-06-05
Published Print: 2017-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Vangelista, Silvia
Piagge, Rossella
Ek, Satu
Sarnet, Tiina
Ghidini, Gabriella
Lamperti, Alessio
Text and Data Mining valid from 2017-06-05
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Article History
First Online: 5 June 2017