Microstructural characterization of phase-separated co-deposited Cu–Ta immiscible alloy thin films
Crossref DOI link: https://doi.org/10.1557/jmr.2020.100
Published Online: 2020-05-26
Published Print: 2020-06-29
Update policy: https://doi.org/10.1017/policypage
Powers, Max
Derby, Benjamin
Shaw, Alex
Raeker, Evan
Misra, Amit
License valid from 2020-05-26
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