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Investigating the Efficiency of Using U-Net, Erf-Net and DeepLabV3 Architectures in Inverse Lithography-based 90-nm Photomask Generation

Published Online: 2023-12-22

Published Print: 2023-12

Authors

Karandashev, I. M.

Teplov, G. S.

Karmanov, A. A.

Keremet, V. V.

Kuzovkov, A. V.
License Information

Text and Data Mining valid from 2023-12-01

Version of Record valid from 2023-12-22
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Article History

Received: 9 August 2023

Revised: 3 October 2023

Accepted: 5 October 2023

First Online: 22 December 2023

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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