Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering
Crossref DOI link: https://doi.org/10.3103/S1062873818090058
Published Online: 2018-10-01
Published Print: 2018-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Boytsova, E. L.
Leonova, L. A.
Text and Data Mining valid from 2018-09-01
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Article History
First Online: 1 October 2018