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Authors
Jyothilakshmi, R.
Sandeep, S.
Mityagin, Yu. A.
Telenkov, M. P.
Nagaraja, K. K.
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Article History
Received: 23 October 2023
Revised: 8 April 2024
Accepted: 9 April 2024
First Online: 25 June 2024
CONFLICT OF INTEREST
: The authors of this work declare that they have no conflicts of interest.
: AlN—aluminum nitride;CMOS—complementary metal oxide semiconductor;MEMS—micro electromechanical system;MBE—molecular beam epitaxy;MOCVD—metal oxide chemical vapor deposition;PLD—pulsed laser deposition;RMS—reactive magnetron sputtering;HRXRD—high-resolution X-ray diffraction;AFM—atomic force microscopy;RMS—root mean square;SAW—surface acoustic wave;BAW—bulk acoustic wave.
