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Effect of the sputtering time on the characteristics of p-SnOx:Na films prepared by the reactive direct current magnetron sputtering method

Crossref DOI link: https://doi.org/10.32508/stdjns.v6i3.1182

Published Online: 2022

Published Print: 2022

Update policy: https://doi.org/10.32508/stdjns.crossmark

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